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Roots Blowers for Thin Film

Roots Blowers for Thin Film

What is Thin Film?

Definition of thin film is a surface of any material on which region whose properties differs from bulk of the material. Thin film is a kind of film and its thickness is maximum 1 µm or less.

Thin film has a key role in high-tech, computer, network and surface industries. Both thin film is used in order to enrich solids surface and it is utilized in computer and networking industry. In addition, emission-free drives and alternative energy for vehicles benefit from thin film technology. Nanotechnology has also been based on it.

There are about six main thin film applications:


  • Optical: Interference filters, decoration, memory discs, reflective and antireflective coatings, waveguides.
  • Electrical: Conduction, insulation, semiconductor devices, piezoelectric drivers.
  • Chemical: Gas sensors, liquid sensors, protection against oxidation or corrosion, barriers to diffusion or alloying.
  • Magnetic: Memory discs.
  • Thermal: Heat sinks, barrier layers.
  • Mechanical: Hardness, adhesion, tribological coatings, micromechanics.
The rotary lobe blowers are commonly used in applications of thin film deposition processes, they are used as backing pumps to a diffusion pump.
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How to use roots blowers in thin film?



Roots Blowers for Low-Pressure CVD:

LPCVD is a deposition way to make coating of many wafers possible at the same time. It is commonly used for deposition of polysilicon, silicon oxide and silicon nitride. LPCVD systems use horizontal hot-wall reactors and require operating pressure. The operating pressure is provided by positive displacement blowers..



Roots Blowers for Vacuum Pumping System:

Outgassing from chamber walls leads to high gas loads in evaporation processes. For this reason, pumping system depends on a diffusion pump which is backed a roots blower pump.



Roots Blowers for Jet Vapor Deposition (JVD):

Jet Vapor Deposition utilizes quick inert gas jets to transport film components to substrates. Roots blowers provide fast flow of inert gas through each jet source. JVD is applied to widespread thin and thick film processes.



Roots Blowers for RPECVD Reactor:

Remote plasma-enhanced chemical vapor deposition (RPECVD) require processing pump that supplies gas flow and process pressure. Roots supercharger can easily assure necessary pressure with high flow rates.



Roots Blowers for Iner Gas Condensation (IGC):

Inert gas condensation (IGC) is an operation that condenser gas coactions quickly cool vaporized material into solid phase. Quick cooling is provided by interactions that are between vaporized material and chamber walls. Circulation of inert gas that is required by process is provided by rotary lobe blowers.



Three Lobes Roots Blowers Pasifik Blower tri-lobe roots blowers

There are eight different tri-lobe roots blowers that we have produced with various capacities and dimensions.

Two Lobes Roots Blowers Pasifik Blower twin lobe roots blowers

There are eight different two lobe roots blowers that we have produced with various capacities and dimensions.

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